The interaction between vapor-deposited Al atoms and...

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G.L Fisher, A Hooper, R.L Opila, D.R Jung, D.L Allara, N Winograd
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Volume:
98-99
Year:
1999
Language:
english
Pages:
10
DOI:
10.1016/s0368-2048(98)00283-7
File:
PDF, 247 KB
english, 1999
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