Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling
Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Schad, Jonathon, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, Greg, Brainard, RoVolume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.14.4.043502
Date:
October, 2015
File:
PDF, 1.06 MB
english, 2015