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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - 0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography
Vorbringer-Doroshovets, Nataliya, Tong, William M., Resnick, Douglas J., Balzer, Felix, Fuessl, Roland, Manske, Eberhard, Kaestner, Marcus, Schuh, Andreas, Zoellner, Jens-Peter, Hofer, Hofer, Guliyev,Volume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2012324
File:
PDF, 2.99 MB
english, 2013