SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

  • Main
  • SPIE Proceedings [SPIE SPIE Advanced...

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - 0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography

Vorbringer-Doroshovets, Nataliya, Tong, William M., Resnick, Douglas J., Balzer, Felix, Fuessl, Roland, Manske, Eberhard, Kaestner, Marcus, Schuh, Andreas, Zoellner, Jens-Peter, Hofer, Hofer, Guliyev,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2012324
File:
PDF, 2.99 MB
english, 2013
Conversion to is in progress
Conversion to is failed