SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Non-ionic photoacid generators for chemically amplified resists: evaluation results on the application-relevant properties
Asakura, Toshikage, Yamato, Hitoshi, Nishimae, Yuichi, Ohwa, Masaki, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.708399
File:
PDF, 297 KB
english, 2007