SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Etch resistance: comparison and development of etch rate models
Perret, Damien, Andes, Cecily E., Cheon, Kap-Soo, Sobhian, Mani, Szmanda, Charles R., Barclay, George G., Trefonas, Peter, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712242
File:
PDF, 339 KB
english, 2007