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Control of Adhesion Force Between Ceria Particles and Polishing Pad in Shallow Trench Isolation Chemical Mechanical Planarization
Seo, Jihoon, Moon, Jinok, Bae, Jae-Young, Yoon, Kwang Seob, Sigmund, Wolfgang, Paik, UngyuVolume:
14
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2014.8241
Date:
June, 2014
File:
PDF, 901 KB
english, 2014