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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Hybrid OPC flow with pattern search and replacement
Lai, Kafai, Erdmann, Andreas, Verma, Piyush, Somani, Shikha, Ping, Yang Y., Pathak, Piyush, Ghaida, Rani S., Babcock, Carl P., Batarseh, Fadi, Wang, Jingyu, Madhavan, Sriram, McGowan, SarahVolume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2087094
File:
PDF, 702 KB
english, 2015