Cu filling into trenches with Co (00.2) layer by using high-vacuum magnetron sputtering in N2-addded Ar gas
Itoh, Masatoshi, Iida, Hiroyuki, Uhara, Yoshio, Saito, ShigeruVolume:
354
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.05.023
Date:
November, 2015
File:
PDF, 1.88 MB
english, 2015