[ACS Symposium Series] Chemical and Catalytic Reactor Modeling Volume 237 || Modeling of Chemical Vapor Deposition Reactors for the Fabrication of Microelectronic Devices
Duduković, Milorad P., Mills, Patrick L.Volume:
10.1021/bk
Year:
1984
Language:
english
DOI:
10.1021/bk-1984-0237.ch011
File:
PDF, 1.50 MB
english, 1984