Critical energy densities for amorphization in Ar-ion...

Physics Letters A 1997 Vol. 227; Iss. 3-4

Critical energy densities for amorphization in Ar-ion implanted silicon at low energies

I.N Koprinarov, U Müller-Jahreis, P Thiele, M Bouafia, A Seghir
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
227
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0375-9601(97)00053-4
File:
PDF, 393 KB
english, 1997
Conversion to is in progress
Conversion to is failed