Dry development for a directed self-assembly lithography...

Journal of Micro/Nanolithography MEMS and MOEMS 2015 / 10 Vol. 14; Iss. 4

Dry development for a directed self-assembly lithography hole-shrink process using CO / H 2 plasma

Omura, Mitsuhiro, Imamura, Tsubasa, Yamamoto, Hiroshi, Sakai, Itsuko, Hayashi, Hisataka
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Volume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.14.4.044505
Date:
October, 2015
File:
PDF, 1.28 MB
english, 2015
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