SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Overlay accuracy investigation for advanced memory device
Cain, Jason P., Sanchez, Martha I., Lee, Honggoo, Lee, Byongseog, Han, Sangjun, Kim, Myoungsoo, Kwon, Wontaik, Park, Sungki, Choi, DongSub, Lee, Dohwa, Jeon, Sanghuck, Lee, Kangsan, Volkovich, Roie, IVolume:
9424
Year:
2015
Language:
english
DOI:
10.1117/12.2085270
File:
PDF, 716 KB
english, 2015