Redistribution of implanted Er in SiO2 on Si studied by combined transmission electron microscopy and Rutherford backscattering analysis
D. Kollewe, T. Bachmann, W. SigleVolume:
253
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0375-9601(99)00022-5
File:
PDF, 420 KB
english, 1999