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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Electron-beam-assisted critical dimension reduction
Chang, Jei-Wei, Chen, Chao-Peng, Yang, Robert, Engelstad, Roxann L.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.484681
File:
PDF, 438 KB
english, 2003