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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - The resist-core spacer patterning process for fabrication of 2xnm node semiconductor devices
Sho, Koutarou, Allen, Robert D., Somervell, Mark H., Oori, Tomoya, Iida, Kazunori, Kobayashi, Katsutoshi, Kikutani, Keisuke, Yamamoto, Katsumi, Aiso, Fumiki, Matsunaga, Kentaro, Shiobara, Eishi, HashiVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.877616
File:
PDF, 1.59 MB
english, 2011