Plasma-chemical treatment effect observed during the fabrication of AlGaN/GaN devices
Enisherlova, K. L., Kulikauskas, V. S., Seidman, L. A., Pishchagin, V. V., Konovalov, A. M., Korneev, V. I.Volume:
9
Language:
english
Journal:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
DOI:
10.1134/S1027451015040084
Date:
July, 2015
File:
PDF, 931 KB
english, 2015