SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

  • Main
  • SPIE Proceedings [SPIE SPIE Advanced...

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - An efficient auto TPT stitch guidance generation for optimized standard cell design

Sturtevant, John L., Capodieci, Luigi, Samboju, Nagaraj C., Choi, Soo-Han, Arikati, Srini, Cilingir, Erdem
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2085834
File:
PDF, 523 KB
english, 2015
Conversion to is in progress
Conversion to is failed