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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity
Blakey, Idriss, Chen, Lan, Goh, Yong-Keng, Lawrie, Kirsten, Chuang, Ya-Mi, Piscani, Emil, Zimmerman, Paul A., Whittaker, Andrew K., Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814076
File:
PDF, 379 KB
english, 2009