[IEEE 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2015.6.4-2015.6.5)] 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Evaluation of SnO2 / Al2O3 thin film deposited by RF magnetron sputtering
Ogawa, Junji, Yoshioka, Toshihiro, Yuge, Masahiro, Matsuda, Tokiyoshi, Kimura, MutsumiYear:
2015
Language:
english
DOI:
10.1109/IMFEDK.2015.7158566
File:
PDF, 387 KB
english, 2015