Stable nanoporous thin films through one-step UV treatment of a block copolymer precursor
Ma, Xia, Sui, Xin, Zhang, Zhenyu, Li, Chao, Zhang, Naifu, Chen, Aihua, Xie, Qiong, Gao, LongchengVolume:
5
Year:
2015
Language:
english
Journal:
RSC Adv.
DOI:
10.1039/C5RA18775C
File:
PDF, 673 KB
english, 2015