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[IEEE 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2015.5.3-2015.5.6)] 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Advanced Process Control (APC) and Real Time Dispatch (RTD) system integration for etch depth control process in 300mm Fab
Agrawal, Gaurav K., Loh, Soon Yoong, Shebi, Abemelek B.Year:
2015
Language:
english
DOI:
10.1109/ASMC.2015.7164426
File:
PDF, 363 KB
english, 2015