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SPIE Proceedings [SPIE Optics & Photonics 2005 - San Diego, CA (Sunday 31 July 2005)] Optical Manufacturing and Testing VI - Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM
Shibahara, Masafumi, Yamamura, Kazuya, Sano, Yasuhisa, Sugiyama, Tsuyoshi, Endo, Katsuyoshi, Mori, Yuzo, Stahl, H. PhilipVolume:
5869
Year:
2005
Language:
english
DOI:
10.1117/12.615604
File:
PDF, 255 KB
english, 2005