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Metalorganic Chemical Vapor Deposition Conditions for Efficient Silicon Doping in High Al-Composition AlGaN Films
Keller, Stacia, Cantu, Pablo, Moe, Craig, Wu, Yuan, Keller, Salka, Mishra, Umesh K., Speck, James S., DenBaars, Steven P.Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.7227
Date:
October, 2005
File:
PDF, 215 KB
english, 2005