SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Line-edge roughness characterized by polymer aggregates in photoresists
Yamaguchi, Toru, Namatsu, Hideo, Nagase, Masao, Kurihara, Kenji, Kawai, Yoshio, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350246
File:
PDF, 2.89 MB
english, 1999