Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
G. Vereecke, S. Arnauts, P. Van Doorne, K. Kenis, B. Onsia, K. Verstraeten, M. Schaekers, J.A.B. Van Hoeymissen, M.M. HeynsVolume:
56
Year:
2001
Language:
english
Pages:
10
DOI:
10.1016/s0584-8547(01)00311-1
File:
PDF, 105 KB
english, 2001