Influence of plasma composition on reflectance anisotropy...

Applied Surface Science 2015 / 12 Vol. 357

Influence of plasma composition on reflectance anisotropy spectra for in situ III–V semiconductor dry-etch monitoring

Barzen, Lars, Kleinschmidt, Ann-Kathrin, Strassner, Johannes, Doering, Christoph, Fouckhardt, Henning, Bock, Wolfgang, Wahl, Michael, Kopnarski, Michael
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Volume:
357
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.09.040
Date:
December, 2015
File:
PDF, 3.33 MB
english, 2015
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