High growth rate chemical vapor deposition of graphene under low pressure by RF plasma assistance
Kato, Ryuichi, Minami, Satoshi, Koga, Yoshinori, Hasegawa, MasatakaVolume:
96
Language:
english
Journal:
Carbon
DOI:
10.1016/j.carbon.2015.10.061
Date:
January, 2016
File:
PDF, 1.52 MB
english, 2016