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The die-to-die calibrated combined model of negative bias temperature instability and gate oxide breakdown from device to system
Cha, Soonyoung, Kim, Dae-Hyun, Liu, Taizhi, Milor, Linda S.Volume:
55
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2015.06.105
Date:
August, 2015
File:
PDF, 2.95 MB
english, 2015