Substrate noise isolation improvement in a single-well...

Integration, the VLSI Journal 2016 / 01 Vol. 52

Substrate noise isolation improvement in a single-well standard CMOS process

Mendonça dos Santos, P., Mendes, Luís, Vaz, João Caldinhas
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Volume:
52
Language:
english
Journal:
Integration, the VLSI Journal
DOI:
10.1016/j.vlsi.2015.09.006
Date:
January, 2016
File:
PDF, 1.90 MB
english, 2016
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