SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

  • Main
  • SPIE Proceedings [SPIE SPIE Advanced...

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Comparison of OPC job prioritization schemes to generate data for mask manufacturing

Sturtevant, John L., Capodieci, Luigi, Lewis, Travis, Veeraraghavan, Vijay, Jantzen, Kenneth, Kim, Stephen, Park, Minyoung, Russell, Gordon, Simmons, Mark
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2086927
File:
PDF, 456 KB
english, 2015
Conversion to is in progress
Conversion to is failed