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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Comparison of OPC job prioritization schemes to generate data for mask manufacturing
Sturtevant, John L., Capodieci, Luigi, Lewis, Travis, Veeraraghavan, Vijay, Jantzen, Kenneth, Kim, Stephen, Park, Minyoung, Russell, Gordon, Simmons, MarkVolume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2086927
File:
PDF, 456 KB
english, 2015