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SPIE Proceedings [SPIE SPIE Scanning Microscopies - Monterey, California, United States (Tuesday 16 September 2014)] Scanning Microscopies 2014 - 3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Postek, Michael T., Newbury, Dale E., Platek, S. Frank, Maugel, Tim K., Villarrubia, J. S., Vladár, A. E., Postek, M. T.Volume:
9236
Year:
2014
Language:
english
DOI:
10.1117/12.2069324
File:
PDF, 936 KB
english, 2014