SPIE Proceedings [SPIE Microelectronic Manufacturing 1996 - Austin, TX (Wednesday 16 October 1996)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II - Plasma-etching-induced oxide degradation: effects upon device performance and circuit yield
Martin, Scott T., Li, Guann-pyng, Worley, Eugene, White, Joe, Keshavarzi, Ali, Prasad, Sharad, Hartmann, Hans-DieterVolume:
2874
Year:
1996
Language:
english
DOI:
10.1117/12.250821
File:
PDF, 787 KB
english, 1996