SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Mask registration impact on intrafield on-wafer overlay performance
Huang, Guo-Tsai, Chen, Alex, Kang, Tung-Yaw, Lee, S. C., Laske, Frank, Roethe, Klaus-Dieter, Choi, DongSub, Reinhart, Chiang, Robinson, John C., Jin, You Seung, Chua, Lin, Tien, David, Nagaswami, VenkVolume:
7971
Year:
2011
Language:
english
DOI:
10.1117/12.879485
File:
PDF, 4.98 MB
english, 2011