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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography; a progress report
Blakey, Idriss, Conley, Will, George, Graeme A., Hill, David J. T., Liu, Heping, Rasoul, Firas, Whittaker, Andrew K., Lin, QinghuangVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.659757
File:
PDF, 430 KB
english, 2006