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Pulse-Biased Etching of Si3N4 Layer in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Resist Structures
Lee, Hyelim, Kim, Sechan, Choi, Gyuhyun, Lee, Nae-EungVolume:
14
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2014.10166
Date:
December, 2014
File:
PDF, 386 KB
english, 2014