Silicon etching characteristics for tetramethylammonium hydroxide-based solution with additives
Kim, Byung-Min, Kim, Jung-Sik, Jun, Ki-WhaVolume:
10
Language:
english
Journal:
Micro & Nano Letters
DOI:
10.1049/mnl.2015.0161
Date:
October, 2015
File:
PDF, 362 KB
english, 2015