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Impact of Copper-Doped Titanium Dioxide Interfacial Layers on the Interface-State and Electrical Properties of Si-based MOS Devices
Akin, Seçkİn, Sönmezoğlu, SavaşVolume:
46
Language:
english
Journal:
Metallurgical and Materials Transactions A
DOI:
10.1007/s11661-015-3040-z
Date:
September, 2015
File:
PDF, 1.17 MB
english, 2015