Fabrication of High Aspect Ratio Poly(ethylene...

Langmuir 2003 / 05 Vol. 19; Iss. 10

Fabrication of High Aspect Ratio Poly(ethylene glycol)-Containing Microstructures by UV Embossing

Chan-Park, Mary B., Yan, Yehai, Neo, Wee Koon, Zhou, Wenxiu, Zhang, Jun, Yue, Chee Yoon
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Volume:
19
Language:
english
Journal:
Langmuir
DOI:
10.1021/la026967t
Date:
May, 2003
File:
PDF, 529 KB
english, 2003
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