Impact of the firing step on Al 2 O 3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
Pawlik, Matthieu, Vilcot, Jean-Pierre, Halbwax, Mathieu, Gauthier, Michel, Le Quang, NamVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.08KD21
Date:
August, 2015
File:
PDF, 3.42 MB
english, 2015