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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Planarizing material for reverse-tone step and flash imprint lithography
Ogawa, Tsuyoshi, Takei, Satoshi, Jacobsson, B. Michael, Deschner, Ryan, Bell, William, Lin, Michael W., Hagiwara, Yuji, Hanabata, Makoto, Willson, C. Grant, Herr, Daniel J. C.Volume:
7637
Year:
2010
Language:
english
DOI:
10.1117/12.846430
File:
PDF, 1.80 MB
english, 2010