[IEEE 2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP) - Suzhou, China (2015.7.1-2015.7.3)] 2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP) - RCS reduction by metasurface with random distribution of reflection phases
Yang, Xin Mi, Jiang, Ge Lan, Liu, Xue Guan, Yang, Jian FengYear:
2015
Language:
english
DOI:
10.1109/IMWS-AMP.2015.7324988
File:
PDF, 725 KB
english, 2015