SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Positive-tone EUV resists: complexes of platinum and palladium
Wood, Obert R., Panning, Eric M., Sortland, Miriam, Del Re, Ryan, Passarelli, James, Hotalen, Jodi, Vockenhuber, Michaela, Ekinci, Yasin, Neisser, Mark, Freedman, Daniel, Brainard, Robert L.Volume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2086598
File:
PDF, 799 KB
english, 2015