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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Finding practical phenomenological models that include both photoresist behavior and etch process effects
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Jung, Sunwook, Do, Thuy, Sturtevant, JohnVolume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2087096
File:
PDF, 580 KB
english, 2015