SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Phenolic molecular glasses as resists for next-generation lithography
André, Xavier, Lee, Jin Kyun, De Silva, Anuja, Felix, Nelson, Ober, Christopher K., Cao, Heidi B., Deng, Hai, Kudo, Hiroto, Watanabe, Daisuke, Nishikubo, Tadatomi, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.722919
File:
PDF, 292 KB
english, 2007