![](/img/cover-not-exists.png)
Comparison of magnetoconductance of the δ-doped layer and bulk crystal of Si : Sb in the weak localization regime
Akira Fujimoto, Hiromi Kobori, Tyuji Ohyama, Shuichi Ishida, Kazuo Satoh, Tadaoki Kusaka, Yoshiharu KakehiVolume:
302-303
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s0921-4526(01)00399-4
File:
PDF, 139 KB
english, 2001