SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Adamantane-based molecular glass resist for 193-nm lithography
Tanaka, Shinji, Murakami, Miki, Fukushima, Kazuya, Kawano, Naoya, Uenoyama, Yohitaka, Ito, Katsuki, Ohno, Hidetoshi, Matsumoto, Nobuaki, Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814070
File:
PDF, 1.05 MB
english, 2009