SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of EUV resist for 22nm half pitch and beyond
Maruyama, Ken, Shimizu, Makoto, Hirai, Yuuki, Nishino, Kouta, Kimura, Tooru, Kai, Toshiyuki, Goto, Kentaro, Sharma, Shalini, La Fontaine, Bruno M.Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846332
File:
PDF, 722 KB
english, 2010