[IEEE 2014 International Conference on Planarization/CMP...

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[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Nano size cerium hydroxide slurry for scratch-free CMP process

Tanaka, Takaaki, Minami, Hisataka, Akutsu, Toshiaki, Iwano, Tomohiro, Hidaka, Takahiro, Shinoda, Takashi, Sakurai, Haruaki, Nobe, Shigeru
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Year:
2014
Language:
english
DOI:
10.1109/ICPT.2014.7017236
File:
PDF, 426 KB
english, 2014
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