SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Chemically amplified molecular resist based on fullerene derivative for nanolithography
Yamamoto, Hiroki, Kozawa, Takahiro, Tagawa, Seiichi, Ando, Tomoyuki, Ohmori, Katsumi, Sato, Mitsuru, Onodera, Junichi, Henderson, Clifford L.Volume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.771835
File:
PDF, 336 KB
english, 2008