Monte Carlo simulation of hot-electron-induced dielectric breakdown in thin silicon dioxide films
Yoshinari Kamakura, Akihiro Ishida, Kenji TaniguchiVolume:
272
Year:
1999
Language:
english
Pages:
3
DOI:
10.1016/s0921-4526(99)00333-6
File:
PDF, 99 KB
english, 1999